Laser-supported reproduction method

ABSTRACT

The invention concerns an apparatus and a process for producing a marking on a substrate. Substrates marked in that way are applied to documents such as for example credit cards, personal identity cards or banknotes as security features for affording protection from forgery. Embodiments of these security features have diffractive or holographic structures. Production of the markings is produced by shaping from a mold. A change in the configuration of the marking is possible by changing the mold, which is time-consuming. The new apparatus and the new process are intended to permit the production of individualised markings on a substrate at a low level of apparatus expenditure. The new apparatus has a replication apparatus, in the form of a replication roller, having a replication surface, a device for producing a radiation and a counterpressure apparatus with a counterpressure surface, wherein a substrate is arranged between the replication surface of the replication apparatus and the counterpressure surface of the counterpressure apparatus in such a way that a shaping region of the replication surface is shaped on to the substrate in a contact region between the replication surface and the substrate.

CROSS-REFERENCE TO RELATED APPLICATIONS

This application is a National Phase application of InternationalApplication No. PCT/DE2003/002670 filed Aug. 8, 2003, which claimspriority based on German Patent Application No. 102 36 597.0, filed Aug.9, 2002, and German Patent Application No. 102 50 476.8, filed Oct. 30,2002, all of which are incorporated herein by reference.

BACKGROUND OF THE INVENTION

The invention concerns a process for producing a marking, for exampledigits, letters, surface patterns, surface images or decoration, on asubstrate, preferably a film, in particular a transfer film, whereinenergy in the form of radiation, preferably laser radiation, isintroduced from a controllable energy source into a replication surfaceof a replication apparatus to produce at least one shaping region andwherein the shaping region of the replication surface is shaped on tothe substrate by the replication apparatus contacting the substrateunder pressure, and an apparatus for producing a marking, for exampledigits, letters, surface patterns, surface images or decoration on asubstrate, preferably a film, in particular a transfer film, comprisinga replication apparatus which has a replication surface, a device forproducing a radiation, preferably a laser installation, wherein theradiation is directed on to at least one portion of the replicationsurface to produce at least one shaping region, and a counterpressureapparatus which has a counterpressure surface, wherein the substrate isarranged between the replication surface of the replication apparatusand the counterpressure surface of the counterpressure apparatus inorder to shape the shaping region on to the substrate in a contactregion between the replication surface and the substrate.

The protection of documents by security features has in the meantimebecome a standard in the case for example of credit cards, personalidentity cards or banknotes. The forgery-proof nature of those featuresis based on the fact that a high level of special knowledge andextensive apparatus equipment is necessary for the production thereof. Aparticularly successful security feature which is difficult to copy isan optical variable device. Embodiments of that security feature havediffractive or holographic structures which, upon a change in the angleof incidence of light or the viewing angle, during visual checking ofthe authenticity of the security feature, lead to an optical effect suchas for example a color change, a motif change or a combination of thetwo. The security feature can thus be checked for its authenticitywithout further technical aids. An essential component part of thosesecurity elements is a generally thermoplastic or UV-hardenable layerinto which the diffractive or holographic structure is embossed in theform of a surface relief. That layer can be part of a transfer film, inwhich case the security element is produced first and thereaftertransferred on to the document to be safeguarded. That layer can also beprovided in the form of an additional layer directly on the article tobe safeguarded. Rotating stamping cylinders as are described for examplein EP 0 419 773 or stamping punches as are disclosed for example in DE25 55 214 are used for transferring the surface relief from a mold on tothe thermoplastic layer. Production of the mold is technically verydemanding and also cost-intensive by virtue of the fine diffractive orholographic structures. To manufacture the molds firstly patterns, alsoreferred to as masters, are produced for example by interfering laserbeams and etching processes or by electron beam writing, which are thengenerally galvanically shaped.

In the case of the known processes, for enhanced forgery-proof nature,the endeavour is that the same security feature is not applied to eachdocument, but the security features are adapted to the respectivedocument or to the identity of the owner of the document, that is to sayindividualised. In that respect two difficulties arise in theabove-mentioned processes:

On the one hand a large number of individualised masters would have tobe produced, which is highly cost-intensive, while secondly the moldshave to be respectively interchanged in the replication apparatuses,which would result in very long equipment setting times. Asalternatives, processes and apparatuses are known, which shape onlypartial regions of a mold in order to produce individualised securityfeatures.

CH 594 495 describes a process for stamping a relief pattern into athermoplastic information carrier, wherein selectively only partialregions of the mold are shaped into the thermoplastic layer. In terms ofprocess engineering, those shaping regions are selected by either thoseregions being heated by heating bands through which current flows, or byonly the selected shaping regions being pressed on to the substrate by acounterpressure device which has partial regions which are adjustable inrespect of height. A high level of local resolution in regard toselection of the shaping regions is not to be expected with that processas heat conduction during the long heating-up and cooling-down phase forthe heating bands means that the boundaries of the shaping regions canbe only inaccurately defined or the dimensions of the shaping regionsare established by the dimensions of the bands or the dimensions of thepartial regions which are adjustable in respect of height. That processis consequently limited by virtue of the fact that it involves a lowlevel of local resolution.

EP 0 169 326 describes an apparatus for producing a marking on asubstrate and the process corresponding thereto. The apparatus has areplication apparatus in the form of an unheated stamping mold and apressure plate in the form of a counterpressure apparatus. The stampingmold has a replication surface which is structured with microstructuresto be shaped. The apparatus has a laser arrangement for producing alaser beam which is directed on to the substrate through thecounterpressure apparatus. The known process provides that firstly thesubstrate is pressed on to the pressure plate by the stamping punch. Dueto absorption of the laser beam which is incident on the substratedirectly in the stamping region, the substrate is selectively locallyheated and raised to a temperature at which it can be durablypermanently deformed. Positioning of the laser beam makes it possible inthat way to selectively select and transfer shaping regions. Alimitation with this process and apparatus is that the replicationapparatus is in the form of a stamping punch. This means that theprocess is limited to a cyclic mode of processing, which is contrary tothe attainment of a high level of productivity.

SUMMARY OF THE INVENTION

The object of the present invention is to provide a process and anapparatus which permit the production of preferably individualisedmarkings on a substrate, preferably a film, involving a low level ofapparatus expenditure.

That object is attained by the process as set forth in claim 1 and theapparatus as set forth in claim 11.

The process according to the invention provides that a marking isproduced on a substrate, preferably a film, in particular a transferfilm, wherein the replication surface is subjected to a temperaturecontrol effect at least in a partial region, using an additionalcontrollable energy source, wherein an energy input by radiation of theradiation source and an energy input from the additional controllableenergy source is introduced into the replication surface so that atleast a portion of the replication surface is in the form of a heatcombination region so that the shaping region is shaped on to thesubstrate, wherein the portion of the replication surface in the form ofthe heat combination region or a portion of the replication surfacewhich is complementary to the heat combination region forms the shapingregion.

The process according to the invention provides that firstly thereplication apparatus is heated with an additional energy source so thatregions or at least partial regions of the structured replicationsurface of the mold are at a first temperature.

The replication surface of the replication apparatus is then exposedusing radiation so that a part of the radiation is absorbed by thereplication surface and energy input into the replication surface takesplace.

The co-operation of the effect of heating the replication apparatus bythe additional energy source and selective heating by the radiationgives rise on the replication surface to regions at differenttemperatures, in particular at least two regions which are set todifferent temperatures. A part of the regions is preferably at the firsttemperature while another part of the regions is preferably at a secondtemperature which is achieved by the additional energy input by theradiation. The regions at the second temperature, by virtue of the wayin which they are produced, can be referred to as heat combinationregions.

The procedure can be carried out in such a way that either the firsttemperature or the second temperature corresponds to the workingtemperature of the shaping operation so that, in a shaping operation,either the partial regions at the first temperature or the partialregions at the second temperature are durably permanently shaped on tothe substrate.

The individualised marking preferably comprises the shapings of thepartial regions of the replication surface, which were selected by theabove-described temperature control effect for a shaping procedure.Individualisation of the marking, that is to say the change in thechoice of the shaped regions, can thus be effected by a change in thetemperature distribution on the replication surface. Such a change canbe carried out by way of the control of the radiation-producing device,for example the laser installation, or the corresponding beam guidanceand beam shaping devices.

In a preferred development of the process the first temperature is in aplastic temperature range T_(plast) for the respective substrate and thesecond temperature is in a flow temperature range T_(fliess) for therespective substrate, the flow temperature range being above the plastictemperature range. The first temperature is preferably at least 100° C.,in particular at least 170° C. The plastic temperature is thesubstrate-specific temperature at which shaping results in a durablypermanent marking in the substrate. The plastic temperature rangepreferably extends between +/−2% of that substrate-specific temperature.A typical temperature range of that kind would be for example 180°C.+/−3.6° C. If the replication apparatus is contacted under pressurewith the substrate while a partial region involves a temperature whichis in the plastic temperature range, the structured replication surfaceis durably permanently shaped from that partial region on to thesubstrate. If the temperature is within a flow temperature range, then,after the mold is separated from the substrate, the deformed material ofthe substrate will begin to flow. As a result the surface structuringswhich are shaped into the substrate are smoothed so that they are notretained as optically active structures on the substrate. In thisimplementation of the process the partial regions which have been set intemperature to a plastic temperature and which have not acquired anyadditional heat input by the radiation are shaped on to the substrate.Negative selective of partial regions can be implemented by virtue ofthe radiation.

In accordance with another preferred embodiment of the process the firsttemperature is in an elastic temperature range T_(elast) for therespective substrate and the second temperature is in a plastictemperature range T_(plast) for the respective substrate, the elastictemperature range being below the plastic temperature range. Preferablythe second temperature is at least 100° C., in particular at least 170°C. If the replication apparatus is contacted under pressure with thesubstrate while a partial region is at a temperature which is in theplastic temperature range, the structured replication surface is durablypermanently shaped from that partial region on to the substrate. Thepartial regions whose temperatures are in the elastic temperature rangecause only elastic deformation of the substrate. After separation of thereplication apparatus from the substrate the surface structures producedspring elastically back and the substrate assumes approximately itsoriginal surface shape again. Then no optically active structures remainon the substrate. In this embodiment of the process therefore the heatcombination regions are selectively transferred. The additional heatinput by the radiation therefore represents a positive selection ofpartial regions.

The substrate can be made up of a plurality of layers. The specifiedtemperatures or the specified temperature ranges of the substrateinvolve in particular temperatures or temperature ranges of athermoplastic layer which is a constituent part of the substrate.Further layers of the substrate, for example the carrier layer of thesubstrate, can be at a different temperature.

In an advantageous development of the invention, the replicationapparatus is in the form of a replication roller, in which caseintroduction of the radiation into the replication roller takes place ata first angular position of the replication roller and contact of thereplication roller with the substrate takes place at a second angularposition. The intermediate angle between the first and second angularpositions in the direction of rotation of the replication roller is sosmall that the heat combination region produced by the radiation in thefirst angular position, after rotation of the replication roller intothe second angular position, still has sharp contours. That is affordedfor example if the blur of the latent heat image, which occurs due toheat conduction, is less than the reciprocal, desired resolution of thereplication process. The definition of the blur circle from geometricaloptics can be used as a measurement in respect of the blur or lack ofsharpness. In the limit case that intermediate angle can be in theregion of 0° so that the two angular positions are arranged inoverlapping relationship.

In addition the object of the invention is attained by an apparatus asset forth in claim 11, wherein the replication surface of thereplication apparatus is provided on an outside of a replication roller.

The apparatus according to the invention serves for applying orproducing a marking on a substrate. The marking has a surfacestructuring which preferably acts diffractively or holographically or amatt structure which preferably scatters diffusively or directedly andwhich is introduced by means of replication processes into athermoplastic layer of a substrate, in particular a body. The substratecan have further layers with various layer materials and a carrierlayer. The marking can be in the form of a figure, digit, character,surface pattern, surface image, text, numbering, security feature or inany other form.

The marking can be introduced into the substrate by means of areplication apparatus having a replication surface which has surfacestructurings. The replication apparatus can be in the form of areplication roller of an at least portion-wise cylindrical shape androtatable about its coaxially extending axis of rotation. The cylindersurface, in particular the cylinder casing, can be in the form of areplication surface.

The substrate is arranged between the replication roller and acounterpressure apparatus, providing a contact region.

The counterpressure apparatus which for example can be in the form of acounterpressure plate or a counterpressure roller has a counterpressuresurface on which the substrate is supported at least in the contactregion so that, in the contact region, the replication roller canco-operate with the substrate under pressure.

With the apparatus according to the invention, partial regions of astamping mold can be selected for the shaping operation targetedly bythe radiation and thus the markings formed from the shapings of thepartial regions are of an individualised configuration. It isparticularly advantageous in that respect that the individualisedidentification in the form of the selection of the regions together witha security feature, more specifically for example the diffractiveregions, are transferred by a common replication operation. In additionthe apparatus according to the invention, by virtue of the continuous,non-cyclic mode of operation, permits economical production.

An advantageous development of the apparatus provides that the radiationis fed through the counterpressure apparatus. In that situation theradiation is transmitted by the counterpressure apparatus or parts ofthe counterpressure apparatus before the radiation impinges on thereplication surface to produce the shaping regions.

In this development of the invention the counterpressure apparatus canalso be transparent. The counterpressure apparatus or parts thereof, inparticular the portions associated with the counterpressure surface, canhave openings and/or inserts which are transparent in respect of theradiation and/or can comprise a material which is transparent in respectof the radiation.

In modified embodiments the counterpressure apparatus is in the form ofa counterpressure roller. In that case the counterpressure roller ispreferably cylindrical, the cylinder surface being in the form of thecounterpressure surface. In particular the counterpressure roller ismounted rotatably about its coaxially extending axis of rotation.

If the counterpressure apparatus is in the form of a counterpressureroller, the feed for the radiation can be effected for example in thevarious ways set out hereinafter:

In a first fashion, the radiation can be arranged to extend outside thecounterpressure roller and can pass through the substrate with adirection of beam propagation which is oriented preferably at an anglewith respect to the rear side and/or the front side of the substrate andcan subsequently impinge on the replication surface.

In a second fashion the radiation can pass through the counterpressureroller along the entire radial extent thereof, in which case theradiation enters through the counterpressure surface in a region of thecounterpressure roller remote from the contact region and issuestherefrom again through the counterpressure surface in the contactregion. In the further course thereof the radiation can pass through thesubstrate with a direction of beam propagation which is preferablyoriented at a right angle with respect to the rear side and/or the frontside of the substrate and can impinge on the replication rollerpreferably in the contact region.

In a third fashion, if the counterpressure roller is in the form of ahollow body, preferably a hollow cylinder, the radiation can also passfrom the hollow space in the hollow body through a wall of the hollowbody, in particular through the cylinder wall, so that the radiationpreferably issues through the counterpressure pressure in the contactregion. In the further course thereof the radiation can pass through thesubstrate with a direction of beam propagation which is preferablyoriented at a right angle with respect to the rear side and/or the frontside of the substrate and can preferably impinge on the replicationroller in the contact region. Particularly for this last embodiment anadvantageous development of the apparatus provides that aradiation-producing unit, preferably a laser installation, or partsthereof, or a beam-deflection unit, is provided within thecounterpressure apparatus.

In a further advantageous development of the apparatus or the process,the radiation for producing the shaping regions is fed to thereplication surface through the substrate. The radiation enters at arear surface of the substrate and issues again at an oppositely disposedfront surface of the substrate and subsequently impinges on thereplication surface. The substrate is preferably transparent in respectof the radiation. In modified embodiments the radiation can partially oralmost completely absorb the radiation in one or more layers. Thedirection of propagation of the radiation within the substrate can beoriented perpendicularly with respect to the front side and/or the rearside of the substrate. In modifications, the radiation passes throughthe substrate inclinedly, in which case the direction of propagation ofthe radiation within the substrate is oriented in an angularrelationship, in particular at an angle of between 60° and 90°, withrespect to the front side and/or the rear side of the substrate.

An advantageous development of the invention provides a coolingapparatus for cooling the replication surface, by which in particular alatent heat image which has been introduced can be erased or modified insome way.

The cooling apparatus can be in the form of a blower, in which case anair flow produced by the blower is directed on to and cools thereplication surface. A gas flow cooling effect can perform a similarfunction, in which case a gas flow and preferably an inert gas flow or anitrogen gas flow impinges on the replication surface and also cools it.

In further configurations the cooling apparatus can be embodied in theform of a cooling roller which is arranged in parallel displacedrelationship with respect to the replication roller and contacts samealong a line-shaped surface. The thermal contact between the replicationroller and the cooling roller provides for dissipation of heat and thuscooling of the replication roller.

When using a replication roller the cooling apparatus is preferablyarranged in such a way that it acts on the replication surface in aregion which, in the direction of rotation of the replication roller, isbetween the contact region of the replication apparatus and thesubstrate, and the point of impingement of the radiation on thereplication surface.

In a further embodiment of the apparatus the radiation-producing deviceis in the form of a laser installation. The laser installation candesirably have a scanner system and/or a mask projection system. For useof a scanner system, the laser beam is shaped in such a way that thediameter of the laser spot upon impinging on the replication apparatusis preferably in a range of between 0.05 mm and 2.0 mm. That laser spotcan be guided over the replication apparatus in sequentially writingmode by the scanner system. In that respect the scanner system can be asystem with deflection devices, for example deflection mirrors, or asystem with flying optics. The position of the laser spot on thereplication apparatus can be altered by the user by means of a control,preferably a path control device, so that various geometrical shapes,images, letters and numbers can be flexibly written on the replicationapparatus with the laser spot. In other embodiments the replicationapparatus can be exposed over an area by a mask projection system. Inthat case the beam shaping can be such that the image of a mask isproduced, for example by a 4f-structure, on the replication apparatus insuch a way that the shape of the laser spot corresponds to the shape ofthe openings in the mask. In that case the mask can be a rigid mask orhowever a matrix arrangement consisting of elements which controlledlytransmit or extinguish the laser beam, which elements can be for examplemovable mirrors or liquid crystal elements.

An advantageous configuration provides a control device, in particular afreely programmable control device, which controls the selection of theirradiation regions preferably by actuation of the radiation-producingdevice. In this advantageous development the patterns of the markingsare prepared in the form of preferably digital items of information, forexample as a data file, which were produced by image processingprograms, computer-aided processes or the like. Those items ofinformation are converted by the control device, in particular byactuation of the laser installation, into a time-dependent change in thepower density in relation to surface area of the radiation impinging onthe replication apparatus. The shaping regions and thus the pattern ofthe marking are determined by the controlled selection of theirradiation regions.

The control of power, beam direction and/or power density in relation tosurface area of the laser beam permits a plurality of modes of operationof the laser beam.

In a first operating mode the laser beam is switched on and off incontrol sequences so that markings which are displaced from each otherare produced on the substrate. The configuration of those variousmarkings can be respectively the same or can differ from one marking toanother by virtue of individualised features, for example by serialnumbering.

In a second mode of operation of the laser beam the laser beam iscontinuously switched on and the point of impingement of the laser beamis moved on the replication roller. The movement of the impingementpoint is effected in the same direction as or in the opposite directionto the replication roller and parallel to the axial extent of thereplication roller. The movement is produced by parallel displacement ofthe laser beam relative to itself or by angular deflection of the laserbeam. In this operating mode a marking can be formed with a patternwhich varies in the direction of advance of the substrate. In particularthis operating mode permits control sequences of movements of the laserbeam for the production of an individual marking to be effected over aplurality of revolutions of the replication roller, that is to say overa plurality of working cycles. By way of example it is possible in thatway to produce text of any length in the direction of advance movementon the substrate. In a modification of this operating mode the laserbeam is continuously switched on and a time-dependent change in the beamprofile of the laser beam is effected.

A combination of the above-mentioned operating modes is also possible.

A desirable development of the apparatus provides that the replicationsurface is structured with a surface relief. That surface relief is thenegative for the structures which are transferred on to the substrate inthe shaping operation. The replication surface can be partially orcompletely structured. The depth of the surface relief is preferablybetween about 0 and 20 μm, in particular between 0.1 and 0.5 μm. Thesurface relief, in particular to form a diffractive or holographicstructure on the substrate, can be provided in partial regions or overthe full surface area involved, in a grating configuration. The gratingspacing, that is to say the spatial frequency, is preferably between4000 lines per mm and 10 lines per mm, in particular being 1000 linesper mm. The replication surface can also be subdivided into partialregions whose dimensions are preferably less than 0.3 mm and whichdiffer from each other in terms of spatial frequency, gratingorientation, kind of grating or other parameters.

In another advantageous configuration of the invention those partialregions can be arranged in periodically repetitive relationship, inparticular alternatingly. Possible embodiments provide that a respectivearrangement of various partial regions, that is to say for example anarrangement of between two and six and preferably three partial regionsforms a pixel unit. A plurality of pixel units can be arranged to form asurface image. Preferably the three partial regions referred to by wayof example, by virtue of their grating structure, represent the threeprimary colors. That pixel unit or also the partial regions can bearranged on the replication surface in regular or periodicallyrepetitive relationship, for example in grating form or alternatingly.

In addition, in particular to produce a matt structure on the substrate,the surface relief can be provided with surface structures which involvea stochastic or quasi-stochastic distribution. A matt structure on asubstrate, as a particular optical effect, produces diffuse scatteringof the light incident on the substrate. To produce a matt structure, thesurface relief has surface structures, for example grooves, channels,craters, holes and so forth, whose respective shapes and/or orientationscan be respectively similar or of any desired nature and which can be ofdistributed on the replication surface uniformly, stochastically orquasi-stochastically. For example the surface relief can be providedwith a structure similarly to a brushed surface.

In a further advantageous configuration the replication apparatus has apressure mold of metal film, in particular of nickel or a nickelcompound. Galvanic shaping of a diffractive structure of a master isfacilitated by the use of metal films of nickel or nickel compounds. Asalternatives to those materials, it is also possible to use a materialwhich, for the wavelength of the laser radiation used, has aparticularly high level of absorption and in particular a higher levelof absorption than nickel. An advantage with that configuration is thatthe radiated energy required, for producing the latent heat image on thereplication apparatus, preferably on the replication surface, ismarkedly reduced. Accordingly it would be possible to use lasers whichare of lower power and thus less expensive in the apparatus.

A particular advantage of the apparatus and the process is thatdifferent markings, which for example are also document-specific orperson-specific, can be shaped on to a substrate from a single mold,wherein partial regions of that mold can be selectively activated orde-activated for the shaping operation.

BRIEF DESCRIPTION OF THE DRAWINGS

Embodiments by way of example of the process and embodiments by way ofexample of the apparatus for producing a marking are describedhereinafter with reference to drawings in which:

FIG. 1 a shows a sectional view of a first embodiment of an apparatusfor applying a marking to a substrate,

FIG. 1 b shows the temperature profile on the replication surface of thereplication apparatus in FIG. 1 a in a co-ordinate system and a markingcorresponding to the temperature profile in the substrate as a sectionalview,

FIG. 2 a shows the same view as in FIG. 1 a of the first embodiment ofthe apparatus of FIG. 1 a with a modification of the process,

FIG. 2 b is a view similar to FIG. 1 b showing the temperature profileon the replication surface of the replication apparatus of FIG. 2 a anda marking corresponding to the temperature profile, in the substrate,

FIG. 3 is a diagrammatic view in section showing the heat distributionin a portion of the replication apparatus in FIG. 1 a upon exposure withthe laser beam,

FIGS. 4 a and b show diagrammatic views to illustrate the principle forproducing a negative and a positive image respectively,

FIGS. 5 a, and b each show a diagrammatic plan view of a respectiveportion of the surface of the replication apparatus of FIG. 1 a and amarking produced by the replication apparatus,

FIG. 6 a is the same view as in FIG. 1 a showing a second embodiment ofan apparatus for applying a marking to a substrate, and

FIG. 6 b shows a view similar to FIG. 1 b illustrating the temperatureprofile on the replication surface of the replication apparatus of FIG.6 a and a marking corresponding to the temperature profile, in thesubstrate.

DETAILED DESCRIPTION OF THE INVENTION

FIG. 1 a is a diagrammatic view in section showing the structure of anembodiment of an apparatus for producing a marking on a substrate 43.The apparatus has a replication roller 41 and a counterpressureapparatus 42 which is in the form of a counterpressure roller and whichis arranged with its axis parallel to the replication roller 41 anddisplaced perpendicularly downwardly. The film-like substrate 43 isprovided in a horizontal orientation between the replication roller 41and the counterpressure apparatus 42. A laser beam 30 passes through thesubstrate 43 and impinges on the replication roller 41. The orientationof the path of the laser beam is described in greater detailhereinafter.

The metallic or metallically encased replication roller 41 is in theform of a cylinder, wherein the corresponding cylinder casing is in theform of a replication surface with surface structurings in the form ofdiffraction stamping structures 46. The diffraction stamping structures46 are of a depth of preferably between nearly 0 μm and 20 μm andinvolve line spacings or spatial frequencies of between 10 lines permillimeter and 4000 lines per millimeter. The replication roller 41 isheated by a controllable inner, that is to say internally acting, heatsource (not shown) so that the entire region of the replication surfacewhich has the diffraction stamping structures 46 can be subjected to atemperature control effect.

The counterpressure apparatus 42 is in the form of a roller in the shapeof a cylinder and comprises rubber or has a casing portion comprisingrubber. The corresponding cylinder casing forms a counterpressuresurface co-operating with the replication surface of the replicationroller 41.

The film-like substrate 43 has a front surface 103 which in FIG. 1 afaces upwardly towards the replication roller 41 and a rear surface 102which in FIG. 1 a faces downwardly towards the counterpressure apparatus42, and is in the form of a multi-layer composite of a thickness of lessthan 1 mm. The multi-layer composite includes a thermoplastic layer 51,a carrier film 50 and optionally one or more, in particular differentlayers 52 such as for example metallisation layers, interference layers,protective lacquer layers, release layers, carrier material layers oradhesive layers.

An arrow 48 and an arrow 49 show the respective directions of rotationof the replication roller 41 and the counterpressure apparatus 42, withthe replication roller 41 rotating in the clockwise direction in FIG. 1a and the counterpressure apparatus 42 rotating in the counter-clockwisedirection. An arrow 47 points in the direction of advance of thesubstrate 43 which moves towards the left in FIG. 1 a. The replicationroller 41, the substrate 43 and the counterpressure apparatus 42co-operate in such a way that the replication surface with thediffraction stamping structures 46 is pressed under a given adjustablepressure against the substrate 43 during the rotation of the replicationroller 41 and the counterpressure apparatus 42. The contact regionbetween the replication roller 41, the counterpressure apparatus 42 andthe substrate 43 forms the replication gap 53.

In FIG. 1 a the laser beam 30 is shown as an arrow arriving inclinedlyfrom bottom right. The illustrated path of the laser beam 30 begins in aregion which is arranged beneath the substrate 43, that is to say on theside of the rear surface 102 of the substrate, and on thesubstrate-entry side of the apparatus. The laser beam 30 is directed onto the replication roller 31, the laser beam 30 being arranged outsidethe counterpressure apparatus 42 over the entire path of the beam. Thelaser beam 30 passes through the rear surface 102 into the substrate 43at an entry angle of less than 30°. The point of entry of the laser beam30 into the substrate 43 is arranged upstream of the replication gap 53in the direction of advance of the substrate 43. The entry angle ismeasured in relation to the surface normal of the substrate 43 at theentry point. The laser beam 30 passes through the substrate 43, issuesthrough the front surface 103 of the substrate 43 and impinges on thereplication surface. Surface portions are identified on the replicationsurface as replication surface portions 70 a, b. This involves theregion of the replication surface, which is treated with the laser beam.

In the position of the apparatus shown in FIG. 1 a a first replicationsurface portion 70 a, in the direction of rotation of the replicationroller 41, is in a position prior to entry into the replication gap 53,more specifically in a position in which the replication surface portion70 a is just being irradiated by the laser beam 30 issuing from thesubstrate 43.

During operation of the apparatus the replication roller 41 rotatescontinuously in the clockwise direction and the replication surfaceportion 70 a is passed through the replication gap 53 in the furthermovement after the irradiation step. In the replication gap 53, theirradiated replication surface portion 70 a is shaped into the substrate43 as a marking.

In the position of the apparatus shown in FIG. 1 a, the secondreplication surface portion 70 b, as viewed in the direction of rotationof the replication roller 41, is in a region downstream of thereplication gap 53. That replication surface portion 70 b has alreadypassed through the phases of irradiation upstream of the replication gap53 and shaping in the replication gap 53. The shaped marking 45corresponding to the replication surface portion 70 is accordinglydisposed in a region of the substrate 43, which is arranged downstreamof the replication gap 53 in the direction of advance of the substrate43.

In the embodiment of the process shown in FIG. 1 a the replicationsurface is raised by an inner controllable heat source to a temperaturewhich is within the elastic temperature range T_(elast).

The replication surface portions 70 a, b are further heated by theadditional energy inputs by means of the laser beam 30 in theirradiation procedure. Due to the combination of the energy input byvirtue of heating with the inner heat source and the additional energyinput by the irradiation procedure involving the laser beam 30, heatcombination regions are formed in the region of the replication surfaceportions 70 a, b. Those heat combination regions represent latent heatimages which can be a simple geometrical shape such as for example acircle, a multi-angled shape, a closed polygon, but can also be in theform of a letter, a digit or a symbol.

In the example of FIG. 1 a the energy inputs are such that the heatcombination regions, that is to say the replication surface portions 70a, b, are at a temperature within the plastic temperature rangeT_(plast) upon making contact with the substrate 43 in the replicationgap 53. Those regions are durably permanently shaped into the substrate43.

The remaining regions on the replication surface are at temperaturesbelow the plastic temperature range T_(plast), upon making contact withthe substrate 43 in the replication gap 53, that is to say they are inthe elastic temperature range T_(elast). Those regions are not durablypermanently shaped into the substrate 43.

After the shaping operation in the replication gap 53 it can bedesirable for the currently prevailing latent heat image to beextinguished and for the replication surface to be put into a conditionin which a fresh latent heat image can be produced there.

For extinguishing the currently prevailing latent heat image, a coolingregion is provided downstream of the replication gap 53 in the directionof rotation of the replication roller 41. The replication surface passesthrough that cooling region and co-operates with a cooling apparatus(not shown in FIG. 1 a). The replication surface is thereby cooled downto a temperature below the temperature range T_(plast).

Then the temperature of the replication surface is again controlled to atemperature within the temperature range T_(elast).

Therefore, the latent heat image is extinguished by a controlled changein the temperature of the replication surface.

Alternatively or additionally the latent heat image is extinguishedspontaneously by heat conduction in the sense of causing the latent heatimage to fade away.

The principle of the process for producing a marking 45 on the substrate43, as is used in FIG. 1 a, will be illustrated once again withreference to FIG. 1 b.

FIG. 1 b shows a co-ordinate system 20 which illustrates the temperatureof the replication surface as it passes through the replication gap 53,in the form of a temperature profile T. FIG. 1 b also shows as asectional view on an enlarged scale the region of the substrate 43 ofFIG. 1 a, which carries the marking 45 corresponding to the temperatureprofile T.

The temperatures of the replication surface during the shaping operationin the replication gap 53 are plotted on the vertical Y-axis in theco-ordinate system 20. The corresponding positions on the replicationsurface along the periphery of the replication roller 41 are plotted onthe horizontal X-axis of the co-ordinate system 20.

The temperature scale on the Y-axis is qualitatively subdivided intothree ranges: the first range is the elastic temperature rangeT_(elast). The temperature range thereabove, involving highertemperatures, is the plastic temperature range T_(plast). The highesttemperature range which is shown above that is the flow temperaturerange T_(fliess).

To illustrate the effects of temperature at the replication surfaceduring the shaping operation on the result of the shaping operation,illustrated below the co-ordinate system is the portion of the substrate43, which corresponds to the temperature profile T. The substrate 43 isoriented in its longitudinal extent in parallel relationship with theX-axis of the co-ordinate system 20.

The temperature profile of the replication surface, which is illustratedalong the X-axis, is subdivided into three regions I, II and III.

In the regions I and III, the replication surface, on passing throughthe replication gap 53, involves temperatures within the elastictemperature range T_(elast). In the region II, on passing through thereplication gap 53, the temperature is within the plastic temperaturerange T_(plast).

Upon contact of the replication surface with the substrate 43, in theregion I the structures are produced in the substrate 43 in the form ofelastic deformations. After separation of the replication surface andthe substrate 43, the substrate 43 in those regions elasticallyresiliently resumes its original shape and no surface structuringsremain in the substrate 43.

In the region II, when contact occurs between the replication surfaceand the substrate 43, a permanently remaining marking is shaped into thesubstrate 43. The marking shown in FIG. 1 b corresponds to the marking45 in FIG. 1 a.

In the region III, similarly to the region I, when the replicationsurface is in contact with the substrate 43, no surface structuring isproduced in the substrate 43.

The process illustrated in FIGS. 1 a and 1 b produces a marking 45 onthe substrate 43, in respect of which only the replication surfaceportions 70 a, 70 b which are irradiated with the laser beam 30, that isto say the heat combination regions, are shaped on to the substrate. Amarking 45 formed in that way is also referred to hereinafter as apositive image.

Described hereinafter is a time-dependent side-effect of the processillustrated in FIGS. 1 a and b, and the compensation for same:

In FIG. 1 a energy input into the replication surface portion 70 a iseffected by means of laser beam 30 in a region on the rotatingreplication roller 41 upstream of the replication gap, more specificallyat a position which involves a rotary angle spacing of about 20° withrespect to the replication gap 53. A time spacing between theirradiation procedure and the shaping procedure results from the spatialspacing between the irradiation position and the shaping position.

The spacing in respect of time results in heat losses (energy losses) inthe heat combination regions, for example by virtue of heat conduction.In the extreme case that effect can mean that the heat combinationregions in the replication gap 53 are at a temperature below the plastictemperature range T_(plast).

To compensate for the heat losses, the energy input by the laser beam 30is suitably increased so that, in the heat combination regions, atemperature within the plastic temperature range T_(plast) on passingthrough the replication gap 53 is guaranteed. The increase can be suchthat, after the irradiation operation, the heat combination regions areinitially at a temperature within the flow temperature range T_(fliess)and, by the time they reach the replication gap 53, they are cooled to atemperature within the plastic temperature range T_(plast).

The above-indicated side-effect can occur not only in connection withthe temperature or temperature range T_(plast), but also in a comparableor similar manner in relation to other temperatures or temperatureranges, for example T_(fliess), T_(elast). Compensation can be effectedin a similar manner to the above-described procedure.

FIG. 2 a shows the same embodiment of the apparatus as in FIG. 1 a, witha second implementation of the process, the difference between theimplementations of the process being in the temperature management.

In the process illustrated in FIG. 2 a the replication surface is raisedby an inner controllable heat source to a temperature which is withinthe plastic temperature range T_(plast).

The irradiated replication surface portions 70 a, b are further heatedby the additional energy input by means of the laser beam 30. The energyinputs are such that, upon making contact with the substrate 43 in thereplication gap 53, the replication surface portions 70 a, b are at atemperature within the flow temperature range T_(fliess).

Upon making contact with the substrate 43 in the replication gap 53,only the non-irradiated regions are at a temperature in the temperaturerange T_(plast), while the irradiated regions there are at a temperaturewithin the temperature range T_(fliess).

In this second embodiment of the process, only the regions of thereplication surface which are complementary to the replication surfaceportions 70 a, b irradiated with the laser beam 30, that is to say whichare complementary to the heat combination regions, are shaped.

The extinction of a latent heat image produced in that way on thereplication surface can be effected in a similar manner to theextinction procedure described with reference to FIG. 1 a.

The principle of carrying out the process as shown in FIG. 2 a is againdiagrammatically shown in FIG. 2 b in the same view as in FIG. 1 b,wherein therefore the temperature pattern T is different from that shownin FIG. 1 b.

The temperature profile T in FIG. 2 b of the replication surface onpassing through the replication gap 53 is in the plastic temperaturerange T_(plast) in the regions I and III, whereas in the region II thetemperature is within the flow temperature range T_(fliess).

In the region I, upon contact of the replication surface with thesubstrate 43, a durably permanent marking is shaped into the substrate43.

Upon contact of the replication surface with the substrate 43, in theregion II, the structures are initially formed in the substrate 43, asplastic deformations. After separation of the replication surface andthe substrate 43, the substrate material begins to flow so that thesurface structurings produced in the substrate 43 do not durably remain.

In the region III, similarly to the region I, upon contact of thereplication surface with the substrate 43, a surface structuring isproduced in the substrate 43.

The substrate 43 in FIG. 2 b has a surface structuring in regionscorresponding to the regions I and III, whereas, in a regioncorresponding to the region II, the surface profile is so-to-speakhealed again, and the surface is almost flat or is of a stochasticstructure. At any event the regions II and the regions I and III arevisually distinguishable.

The process illustrated in FIGS. 2 a and 2 b produces a marking 45 onthe substrate 43, in which only the regions which have not beenirradiated with the laser beam are shaped. Such markings are alsoreferred to hereinafter as a negative image.

FIG. 3 is a sectional view of a replication apparatus 35 correspondingto the replication roller 41 in FIG. 1 a. The replication apparatus 35is provided at its replication surface with surface structurings 36.Isotherms 32 show the heat distribution in the replication apparatus inthe region of the surface structuring 36. For simplification purposes,the Figure only shows three isotherms 32 which delimit from each otherregions involving different temperatures T₁, T₂ and T₃. The Figure alsoshows the laser beam 30 which is directed on to the replication surfacewith the surface structuring 36 and impinges thereon, as well as adiagrammatic indication of the absorption volume 31.

In a first step in the process, in the proximity of the replicationsurface with the surface structuring 36, the replication apparatus isset to a first temperature T₁, in the regions I, II and III shown here.

In the next step in the process which however can also overlap in timewith the first step in the process, the replication apparatus 35 isexposed with the laser beam 30 in the region II. In that case the laserbeam 30 is absorbed at the replication surface with the surfacestructuring 36, in an absorption volume 31. The energy input in theabsorption volume 31 provides that the absorption volume furtherincreases, from the temperature T₁, to a temperature T₃. Heat conductioncauses the temperature region T₁ to be further displaced into thereplication apparatus, and this affords a heat distribution as shown inFIG. 3. Depending on the initial temperature T₁ and the energy input aswell as the position and the extent of the laser beam 30, it is possibleto produce a temperature profile as shown in FIG. 1 b for a positiveimage or a temperature profile as shown in FIG. 2 b for a negative imageon the replication surface.

FIGS. 4 a and b show the principle of the way in which an individualisedsecurity feature can be produced by various embodiments of the process.Shown at the left as a plan view in each case is a partial region of thereplication surface such as for example from the replication roller 41of FIG. 1 a, with a structured surface 2. Shown at the right as a planview is a portion 4 from a substrate after the shaping operation as forexample from the substrate 43 in FIG. 1 a.

In FIG. 4 a the k-shaped surface portion 3 of the surface 2 is at atemperature T which is within the plastic temperature range T_(plast) ofthe substrate. Outside that region the surface 2 is at a temperaturewhich is outside the plastic temperature range T_(plast). In a shapingoperation with that temperature distribution, a positive image 5 isproduced on the substrate 43, the mirror-image k-shaped surface portionof the positive image being filled with the impression of the surfacestructurings of the structured surface 2.

In FIG. 4 b the k-shaped surface portion is at a temperature T outsidethe plastic temperature range T_(plast) and the remaining regions of thesurface 2 are at a temperature T within that range. The durablypermanent impression on the substrate 43, which results from thattemperature distribution in a shaping operation, is a negative image 6,the regions which are complementary to the mirror-image k-shaped surfaceportion being filled with the impression of the surface structurings ofthe structured surface 2.

FIG. 5 a shows a portion of the replication surface of the replicationroller 41 in FIG. 1 a with a diffraction stamping structure 46 which issubdivided into various partial regions. Those partial regions areformed from a limited number of diffraction patterns which differ inrespect of spatial frequency, relief depth, azimuth, curvature of thegrating, the profile shape or other parameters. The view in FIG. 5 ashows as representative of the many possible options partial regionswith three different diffraction patterns, in particular with adifferent azimuth, namely 80, 81 and 82. Each partial region 80, 81 and82 respectively has only one diffraction pattern. Those differentpartial regions 80, 81, 82 are arranged regularly alternately as pixels.Preferably the partial regions 80, 81, 82 are in the form of delimitedsurface fields of a square contour, for example with side lengths ofless than or equal to 0.3 mm. By means of the process set forth herein,it is now possible, by exposure with radiation, in particular laserradiation, to activate or de-activate partial regions 80, 81, 82 fortransfer from the replication roller on to the substrate, in order toproduce a positive or a negative image in a replication operation. Animage 85 produced in that way has partial region shapings 80′, 81′, 82′in respect of the partial regions 80, 81, 82.

In this embodiment the partial regions 80, 81, 82 of the diffractionstamping structure 46 were selected by the heat distribution in thereplication apparatus in such a way that the image 85 produced has imageregions 86, 87, 88 which each have only one kind of diffractionpatterns, that is to say they are each respectively formed only from onekind of partial region shapings 80′, 81′, 82′, namely the image region86 is formed exclusively from partial region shapings 81′, the imageregion 87 exclusively from partial region shapings 82′ and the imageregion 88 exclusively from partial region shapings 80′. When the image85 is considered, those image regions 86, 87, 88 comprising individualseparate partial region shapings appear as full-area, homogenous imageregions as are known from conventionally produced images, with thedifference that the image regions 86, 87, 88 have particular opticalproperties, for example holographic properties.

FIG. 5 b shows on the left-hand side, as a similar view to FIG. 5 a,another portion of the replication surface of the replication roller 41of FIG. 1 a with a diffraction stamping structure 46. The diffractionstamping structure again has different partial regions 80, 81, 82. Theright-hand side of FIG. 5 b diagrammatically shows a different image 95which is produced after selection and shaping of the partial regions 80,81, 82, in accordance with the above-outlined process. The image 95 hasimage regions 96, 98 and image regions 97, 99. The image regions 96, 98are each in the form of a digit and more specifically 1 and 5respectively and are filled with partial region shapings of a singlekind, namely the partial region shaping 82′. The image regions 97, 99 incontrast are in the form of letters A and D and comprise a plurality ofpartial region shapings 81′. The partial region shapings 81′ and 82′ inFIG. 5 b differ by virtue of the arrangement, in particular theazimuthal orientation, of the diffraction gratings, wherein in FIG. 5 bthe diffraction gratings in the partial region shaping 82′ are arrangedin a lying position while in the case of the partial region shaping 81′they are arranged in an upright position. The differing arrangement ofthe diffraction gratings results in an angle-dependent diffractioneffect so that, besides their geometrical information, digits orletters, the image regions 96, 98 and 97, 99 additionally also carryholographic information. In the case of the image 95, only the firstcharacters 96, 98 are visible at a first viewing angle and only thesecond characters 97, 99 are visible at a second viewing angle.

FIG. 6 a shows a second embodiment of an apparatus for producing amarking in the same view as the apparatus of FIG. 1 a. Similarly to theapparatus of FIG. 1 a, the apparatus shown in FIG. 6 a has anarrangement comprising a replication roller 41, a substrate 43 and acounterpressure apparatus 42. In FIG. 6 a however the counterpressureapparatus 42 and the arrangement and the path of the laser beam 30differ from FIG. 1 a. The principle of the process, which has alreadybeen described with reference to FIG. 1 b, is clearly shown in FIG. 6 b.

In the embodiment of FIG. 6 a, the counterpressure apparatus 42 is inthe form of a hollow cylinder with a hollow space 101 and a cylinderwall 100, the outside of the cylinder wall 100 being in the form of acounterpressure surface. The inside surface of the cylinder wall 100 isarranged in concentric relationship with the counterpressure surface.The cylinder wall 100 comprises a material which is transparent for theradiation, for example glass or plastic material.

The laser beam 30, starting from the hollow space 101, is directed on tothe replication roller 41. Starting from the hollow space 101, the laserbeam 30 penetrates into the cylinder wall 100 through the inside surfacethereof, passes through the cylinder wall 100 and issues from thecylinder wall 100 through the counterpressure surface. In its furtherpath, the laser beam 30 passes through the substrate 43. After issuingfrom the substrate 43 the laser beam 30 irradiates a replication surfaceportion 70 a arranged in the region of the replication gap 53. In thisembodiment therefore, a heat combination region is only formed directlyin the region of the replication gap 53.

In further embodiments, parts of a laser source or an entire lasersource, for example a diode laser, are integrated into the replicationroller 41 or the feed of the laser beam 30 into the hollow space 101 iseffected for example by way of one or more optical waveguides or by wayof open beam guidance extending coaxially with respect to thereplication roller 41. In addition beam guide devices or beam shapingdevices, for example scanner devices, can be provided in the replicationroller 41.

The process for producing a marking and control of the laser beam 30 aswell as structural or functional features are similar to theconfigurations and description relating to the first embodiment of theapparatus in FIG. 1 a so that it is also possible to produce positiveand negative images with the apparatus of FIG. 6 a.

1. A process for producing a marking on a substrate, wherein energy inthe form of radiation is introduced from a controllable energy sourceinto surface structurings of a replication surface of a replicationapparatus to produce at least one shaping region, wherein the shapingregion of the replication surface is shaped on to the substrate by thereplication apparatus contacting the substrate under pressure, whereinthe replication surface is subjected to a temperature control effect atleast in a partial region using an additional controllable energysource, wherein an energy input by radiation from the radiationproducing energy source and an energy input from the additionalcontrollable energy source is introduced into the replication surface sothat at least one portion of the replication surface is in the form of aheat combination region, wherein at least two portions of thereplication surface are set to different temperatures, wherein themarking is formed by shaping the shaping region on the substrate,wherein the portion of the replication surface which is in the form ofthe heat combination region directly and/or indirectly forms the shapingregion, and wherein, for the moment in time of the shaping operation,the temperature of the replication surface is set such that: thetemperature of the replication surface outside the heat combinationregion is set to a temperature or a temperature range in the plastictemperature range of the substrate and the temperature of thereplication surface within the heat combination region is set to atemperature or a temperature range in the flow temperature range of thesubstrate; or the temperature of the replication surface outside theheat combination region is set to a temperature or a temperature rangein the elastic temperature range of the substrate and the temperature ofthe replication surface within the heat combination region is set to atemperature or a temperature range in the plastic temperature range ofthe substrate.
 2. A process as set forth in claim 1, wherein theradiation introduced to produce the at least one shaping region is fedthrough the substrate.
 3. A process as set forth in claim 1, wherein arotating replication roller having the replication surface on itsoutside is used as the replication apparatus and the radiation isintroduced into the replication surface of the replication roller beforeand/or while the heat combination region resulting therefrom comes intocontact with the substrate for the shaping operation.
 4. A process asset forth in claim 3, wherein a counterpressure apparatus co-operatingwith the replication roller is used, and the radiation for producing theat least one shaping region is supplied through the counterpressureapparatus or parts of the counterpressure apparatus into the replicationsurface of the replication roller.
 5. A process as set forth in claim 3,wherein introduction of the radiation into the replication surface ofthe replication roller is effected at a first angular position of thereplication roller and the shaping operation by contact of thereplication surface of the replication roller with the substrate iseffected at a second angular position of the replication roller,wherein, in the direction of rotation of the replication roller, anintermediate angle of less than 30° is set between the first angularposition and the second angular position.
 6. A process as set forth inclaim 3, wherein a control sequence for actuation of theradiation-producing device extends over more than one revolution of thereplication roller.
 7. A process as set forth in claim 1, wherein theradiation acts over an area and !or in point form sequentially on thereplication surface.
 8. A process as set forth in claim 1, wherein theposition of the impingement point of the radiation on the replicationsurface is controllable by a one-dimensional or multi-dimensionalmovement of the radiation and/or the power density in relation tosurface area of the radiation at the impingement point of the radiationon the replication surface is controllable.
 9. A process as set forth inclaim 1, wherein the substrate is a transfer film.
 10. A process as setforth in claim 1, wherein the energy introduced into the surfacestructurings of the replication surface is laser radiation energy. 11.Apparatus for producing a marking on a substrate comprising: areplication apparatus which is in the form of a replication roller,wherein a replication surface having surface structurings is provided onan outside of the replication roller, a controllable energy source forproducing a radiation wherein the radiation for producing at least oneshaping region is directed on to at least one portion of the replicationsurface, and a counterpressure apparatus which has a counterpressuresurface, wherein the substrate is arrangeable between the replicationsurface of the replication apparatus and the counterpressure surface ofthe counterpressure apparatus in order to shape the shaping region on tothe substrate in a contact region between the replication surface andthe substrate, wherein there is provided an additional controllableenergy source in the form of a heating apparatus for temperature controlof the replication surface, wherein at least two portions of thereplication surface are settable to different temperatures by an energyinput of radiation from the energy source and an energy input from theheating apparatus into the replication surface so that at least oneportion of the replication surface is in the form of a heat combinationregion, wherein the marking is formable by shaping the shaping region onthe substrate, wherein the portion of the replication surface which isin the form of the heat combination region directly and/or indirectlyforms the shaping region, and wherein, for the moment in time of ashaping operation, the replication surface has an operable temperaturerange such that: the temperature of the replication surface outside theheat combination region is set to a temperature or a temperature rangein the plastic temperature range of the substrate and the temperature ofthe replication surface within the heat combination region is set to atemperature or a temperature range in the flow temperature range of thesubstrate; or the temperature of the replication surface outside theheat combination region is set to a temperature or a temperature rangein the elastic temperature range of the substrate and the temperature ofthe replication surface within the heat combination region is set to atemperature or a temperature range in the plastic temperature range ofthe substrate.
 12. Apparatus as set forth in claim 11, wherein theposition in which the radiation acts on the portion of the replicationsurface during the irradiation operation and the position of the contactregion between the replication surface and the substrate are arranged inoverlapping relationship and/or in the direction of rotation of thereplication roller with a spacing angle of a magnitude of less than 30°.13. Apparatus as set forth in claim 11, wherein the radiation forproducing the at least one shaping region is fed through thecounterpressure apparatus or parts of the counterpressure apparatus. 14.Apparatus as set forth in claim 11, wherein the counterpressureapparatus, in the region of the counterpressure surface, is transparentfor the radiation.
 15. Apparatus as set forth in claim 11, wherein thecounterpressure apparatus is in the form of a counterpressure roller.16. Apparatus as set forth in claim 11, wherein the counterpressureapparatus is completely or portion-wise in the form of a hollow body.17. Apparatus as set forth in claim 16, wherein the hollow body is ahollow glass cylinder having a cylinder wall which is transparent forthe radiation.
 18. Apparatus as set forth in claim 11, wherein thedevice for producing the radiation and/or a beam deflection unit isarranged within the counterpressure apparatus or within the replicationroller.
 19. Apparatus as set forth in claim 11, wherein the radiationfor producing the shaping regions is fed through the substrate. 20.Apparatus as set forth in claim 11, wherein there is provided anapparatus for temperature control of the replication surface, namely acooling apparatus for cooling the replication surface.
 21. Apparatus asset forth in claim 11, wherein the heating apparatus is provided forheating the replication surface.
 22. Apparatus as set forth in claim 11,wherein a marking comprising surface structurings which actdiffractively or holographically is producible by the surfacestructurings of the replication surface.
 23. Apparatus as set forth inclaim 11, wherein a marking comprising a matt structure which scattersdiffusely or directedly is producible by the surface structurings of thereplication surface.
 24. Apparatus as set forth in claim 11, wherein amarking comprising surface structurings which act diffractively orholographically is produced by the surface structurings of thereplication surface.
 25. Apparatus as set forth in claim 11, wherein amarking comprising a matt structure which scatters diffusely ordirectedly is produced by the surface structurings of the replicationsurface.
 26. Apparatus as set forth in claim 11, wherein the substrateis a transfer film.
 27. Apparatus as set forth in claim 11, wherein thecontrollable energy source is a laser installation.
 28. Apparatus forproducing a marking on a substrate comprising: a replication apparatuswhich is in the form of a replication roller, wherein a replicationsurface having surface structurings is provided on an outside of thereplication roller, a controllable energy source for producing aradiation wherein the radiation for producing at least one shapingregion is directed on to at least one portion of the replicationsurface, and a counterpressure apparatus which has a counterpressuresurface, wherein the substrate is arrangeable between the replicationsurface of the replication apparatus and the counterpressure surface ofthe counterpressure apparatus in order to shape the shaping region on tothe substrate in a contact region between the replication surface andthe substrate, wherein there is provided an additional controllableenergy source in the form of a heating apparatus for temperature controlof the replication surface, wherein at least two portions of thereplication surface are settable to different temperatures by an energyinput of radiation from the energy source and an energy input from theheating apparatus into the replication surface so that at least oneportion of the replication surface is in the form of a heat combinationregion, wherein the marking is formable by shaping the shaping region onthe substrate, wherein the portion of the replication surface which isin the form of the heat combination region directly and/or indirectlyforms the shaping region, and wherein the radiation for producing the atleast one shaping region is fed through the counterpressure apparatus orparts of the counterpressure apparatus.
 29. Apparatus for producing amarking on a substrate comprising: a replication apparatus which is inthe form of a replication roller, wherein a replication surface havingsurface structurings is provided on an outside of the replicationroller, a controllable energy source for producing a radiation whereinthe radiation for producing at least one shaping region is directed onto at least one portion of the replication surface, and acounterpressure apparatus which has a counterpressure surface, whereinthe substrate is arrangeable between the replication surface of thereplication apparatus and the counterpressure surface of thecounterpressure apparatus in order to shape the shaping region on to thesubstrate in a contact region between the replication surface and thesubstrate, wherein there is provided an additional controllable energysource in the form of a heating apparatus for temperature control of thereplication surface, wherein at least two portions of the replicationsurface are settable to different temperatures by an energy input ofradiation from the energy source and an energy input from the heatingapparatus into the replication surface so that at least one portion ofthe replication surface is in the form of a heat combination region,wherein the marking is formable by shaping the shaping region on thesubstrate, wherein the portion of the replication surface which is inthe form of the heat combination region directly and/or indirectly formsthe shaping region, and wherein the counterpressure apparatus, in theregion of the counterpressure surface, is transparent for the radiation.30. Apparatus for producing a marking on a substrate comprising: areplication apparatus which is in the form of a replication roller,wherein a replication surface having surface structurings is provided onan outside of the replication roller, a controllable energy source forproducing a radiation wherein the radiation for producing at least oneshaping region is directed on to at least one portion of the replicationsurface, and a counterpressure apparatus which has a counterpressuresurface, wherein the substrate is arrangeable between the replicationsurface of the replication apparatus and the counterpressure surface ofthe counterpressure apparatus in order to shape the shaping region on tothe substrate in a contact region between the replication surface andthe substrate, wherein there is provided an additional controllableenergy source in the form of a heating apparatus for temperature controlof the replication surface wherein at least two portions of thereplication surface are settable to different temperatures by an energyinput of radiation from the energy source and an energy input from theheating apparatus into the replication surface so that at least oneportion of the replication surface is in the form of a heat combinationregion, wherein the marking is formable by shaping the shaping region onthe substrate, wherein the portion of the replication surface which isin the form of the heat combination region directly and/or indirectlyforms the shaping region, and wherein the counterpressure apparatus iscompletely or portion-wise in the form of a hollow body.